Semiconductor Engineering· Technical Paper Link·· 17 天前AI 评分34
中科院等团队研究Pt-W合金作为更薄High-NA EUV掩模吸收层
Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)
AI 导读
中国科学院、吉林大学等团队发表论文，评估Pt-W合金作为下一代低n EUV掩模吸收层，研究其薄膜特性与成像性能。该合金有望用于更薄的High-NA EUV掩模吸收层。
来源：Semiconductor Engineering · semiengineering.com